Mass of Cu deposited = Area x thickness x density = electrochemical equivalent x current x time.
Thickness = \(\frac{\text{electrochemical equivalent} \times \text{current} \times \text{time}}{Area \times density}\)
= \(\frac{3.3 \times 10^{-7} \times 5 \times 3600}{60 \times 10^{-4} \times 8.9 \times 10^{3}}\)
= 1.1 x 10\(^{-4}\) m

